Work

EUV lithography optics for sub-9nm resolution

Year: 2015

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.2175488

Authors: Bernhard Kneer, Sascha Migura, Winfried Kaiser, Jens Timo Neumann, Jan van Schoot

Institution: ASML (Netherlands)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Bundesministerium für Bildung und Forschung

OpenAlex ID: W2011236388

FWCI: 16.07

Cites: 4

Cited by: 69

Related to: 10