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Selective molecular assembly patterning at the nanoscale: a novel platform for producing protein patterns by electron-beam lithography on SiO2/indium tin oxide-coated glass substrates

Year: 2005

Type: article

Abstract: Selective molecular assembly patterning at the nanoscale: a novel platform for producing protein patterns by electron-beam lithography on SiO2/indium tin oxide-coated glass substrates, Lussi, Jost W, Tang, Clarence, Kuenzi, Pierre-Andre, Staufer, Urs, Csucs, Gabor, Vörös, Janos, Danuser, Gaudenz, Hubbell, Jeffrey A, Textor, Marcus

Source: Nanotechnology

DOI: 10.1088/0957-4484/16/9/062

Authors: Jost W Lussi, Clarence Tang, Pierre-Andre Kuenzi, Urs Staufer, Gabor Csucs, Janos Vörös, Gaudenz Danuser, Jeffrey A Hubbell, Marcus Textor

Institutions: ETH Zurich, Institute for Biomedical Engineering, Empa, University of Neuchâtel

Language: English

Topic: Nanofabrication and Lithography Techniques

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: green

Funder: Eidgenössische Technische Hochschule Zürich

OpenAlex ID: W2011607773

FWCI: 4.437

Cites: 32

Cited by: 49

Related to: 10