Work

XLR 500i: recirculating ring ArF light source for immersion lithography

Year: 2007

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.712684

Authors: D.J. W. Brown, P. O'Keeffe, V. B. Fleurov, R. Rokitski, R. Bergstedt, I. V. Fomenkov, K. O'Brien, N. R. Farrar, W. N. Partlo

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2011984626

FWCI: 1.51

Cites:

Cited by: 8

Related to: 10