Work

Mechanism of Resist Pattern Collapse during Development Process

Year: 1993

Type: article

Source: Japanese Journal of Applied Physics

DOI: 10.1143/jjap.32.6059

Authors: Toshihiko Tanaka, Mitsuaki Morigami Mitsuaki Morigami, Nobufumi Atoda Nobufumi Atoda

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2014880400

FWCI: 6.727

Cites: 3

Cited by: 360

Related to: 10