Work

New approach to 193-nm photoresists: polyspironorbornane polymers

Year: 1998

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.312471

Authors: Robert P. Meagley, Linus Y. Park, Jean M. J. Frechet

Institution: University of California, Berkeley

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2015390532

FWCI:

Cites:

Cited by:

Related to: 10