Ferroelectric thin films: Review of materials, properties, and applications
Year: 2006
Type: article
Abstract: An overview of the state of art in ferroelectric thin films is presented. First, we review applications: microsystems’ applications, applications in high frequency electronics, and memories based on ferroelectric materials. The second section deals with materials, structure (domains, in particular), and size effects. Properties of thin films that are important for applications are then addressed: polarization reversal and properties related to the reliability of ferroelectric memories, piezoelectric nonlinearity of ferroelectric films which is relevant to microsystems’ applications, and permittivity and loss in ferroelectric films—important in all applications and essential in high frequency devices. In the context of properties we also discuss nanoscale probing of ferroelectrics. Finally, we comment on two important emerging topics: multiferroic materials and ferroelectric one-dimensional nanostructures.
Source: Journal of Applied Physics
DOI: 10.1063/1.2336999
Institutions: École Polytechnique Fédérale de Lausanne, Dresden Integrated Center for Applied Physics and Photonic Materials, Technische Universität Dresden, Ericsson (Sweden), Chalmers University of Technology, Samsung (South Korea), Samsung Advanced Institute of Technology (South Korea), North Carolina State University, Forschungszentrum Jülich, Argonne National Laboratory
Language: English
Subfield: Materials Chemistry
Field: Materials Science
Domain: Physical Sciences
Open Access status: green
OpenAlex ID: W2015445221