Work

Measurement of electrical activation energy in boron-doped diamond using the flatband capacitance method

Year: 1998

Type: article

Source: Journal of Applied Physics

DOI: 10.1063/1.367175

Authors: Kun Liu, Junhao Chu, Collin Johnston, Siegmar Roth

Institutions: Shanghai Institute of Technical Physics, Ricardo AEA (United Kingdom), Max Planck Institute for Solid State Research

Language: English

Topic: Diamond and Carbon-based Materials Research

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2016403933

FWCI:

Cites: 22

Cited by: 4

Related to: 10