Work

In Situ AFM Study of Surface Layer Removal during Copper CMP

Year: 2003

Type: article

Source: Electrochemical and Solid-State Letters

DOI: 10.1149/1.1576051

Authors: T. K. Berdyyeva, S. B. Emery, I. Yu. Sokolov

Institution: Clarkson University

Language: English

Topic: Advanced Surface Polishing Techniques

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2017644964

FWCI: 0.256

Cites: 23

Cited by: 21

Related to: 10