Correlation between macroscopic and microscopic stress fields: Application to the 3C–SiC/Si heteroepitaxy
Year: 2012
Type: article
DOI: 10.1557/jmr.2012.264
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2019644639
