Work

Patterning Polymeric Structures with 2 nm Resolution at 3 nm Half Pitch in Ambient Conditions

Year: 2007

Type: article

Source: Nano Letters

DOI: 10.1021/nl070328r

Authors: R. V. Martínez, N. S. Losilla, J. Martinez, Y. Huttel, R. Garcia

Institutions: Consejo Superior de Investigaciones Científicas, Instituto de Ciencia de Materiales de Madrid

Language: English

Topic: Nanofabrication and Lithography Techniques

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2020141321

FWCI: 5.492

Cites: 29

Cited by: 83

Related to: 10