Work

Deposition of highly oriented lanthanum nickel oxide thin film on silicon wafer by CSD

Year: 2007

Type: article

Source: Journal of the European Ceramic Society

DOI: 10.1016/j.jeurceramsoc.2007.02.026

Authors: H. Suzuki, T. Naoe, H. Miyazaki, T. Ota

Institutions: Shizuoka University, Shimane University, Nagoya Institute of Technology

Language: English

Topic: Electronic and Structural Properties of Oxides

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2020290457

FWCI: 0.863

Cites: 17

Cited by: 27

Related to: 10