Sub-5 nm Domains in Ordered Poly(cyclohexylethylene)-block-poly(methyl methacrylate) Block Polymers for Lithography
Year: 2014
Type: article
Source: Macromolecules
DOI: 10.1021/ma4020164
Authors: Justin G. Kennemur, Li Yao, Frank S. Bates, Marc A. Hillmyer
Institution: University of Minnesota
Language: English
Subfield: Materials Chemistry
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2020337437