Work

BARC surface property matching for negative-tone development of a conventional positive-tone photoresist

Year: 2011

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.881508

Authors: Douglas J. Guerrero, Vandana Krishnamurthy, Daniel M. Sullivan

Institution: Brewer Science (United States)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: Fonds Français pour l'Environnement Mondial, Bhabha Atomic Research Centre

OpenAlex ID: W2020519618

FWCI: 1.302

Cites: 5

Cited by: 3

Related to: 10