Work

New single-layer positive photoresists for 193-nm photolithography

Year: 1997

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.275867

Authors: Uzodinma Okoroanyanwu, Tsutomu Shimokawa, Jeff D. Byers, David R. Medeiros, C. Grant Willson, Qingshang J. Niu, Jean M. J. Frechet, Robert D. Allen

Institutions: The University of Texas at Austin, University of California, Berkeley, IBM (United States), IBM Research - Almaden

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: Semiconductor Research Corporation, Intel Corporation

OpenAlex ID: W2021734355

FWCI: 7.586

Cites:

Cited by: 10

Related to: 10