Work

Boron Diffusion in Silicon‐Concentration and Orientation Dependence, Background Effects, and Profile Estimation

Year: 1975

Type: article

Source: Journal of The Electrochemical Society

DOI: 10.1149/1.2134326

Author: Richard B. Fair

Institution: Dextra Laboratories (United Kingdom)

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2022989530

FWCI: 4.029

Cites:

Cited by: 110

Related to: 10