Work

Stability of Order in Solvent-Annealed Block Copolymer Thin Films

Year: 2003

Type: article

Source: Macromolecules

DOI: 10.1021/ma0212792

Authors: Sanjun Niu, Ravi F. Saraf

Institution: Virginia Tech

Language: English

Topic: Block Copolymer Self-Assembly

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2024311166

FWCI: 2.971

Cites: 22

Cited by: 65

Related to: 10