Advances in Patterning Materials for 193 nm Immersion Lithography
Year: 2010
Type: review
Source: Chemical Reviews
DOI: 10.1021/cr900244n
Author: Daniel P. Sanders
Institution: IBM Research - Almaden
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2025326903