Work

Evaluation of contaminant-induced charge from oxide chemical-mechanical polish

Year: 1995

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.221196

Authors: Peter Burke, John K. Lowell, Lubek Jastrzebski

Institution: Advanced Micro Devices (United States)

Language: English

Topic: Advanced Surface Polishing Techniques

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2027667490

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