Nanocrystalline Si thin films with arrayed void-column network deposited by high density plasma
Year: 2000
Type: article
Source: Journal of Applied Physics
DOI: 10.1063/1.373695
Authors: A. Kaan Kalkan, Sanghoon Bae, Handong Li, Daniel J. Hayes, Stephen J. Fonash
Institution: Pennsylvania State University
Language: English
Subfield: Materials Chemistry
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2028056748