Work

Thermally excited silicon oxide bridge resonators in CMOS technology

Year: 1992

Type: article

Source: Journal of Micromechanics and Microengineering

DOI: 10.1088/0960-1317/2/3/023

Authors: O Brand, H Baltes, U Baldenweg

Institution: ETH Zurich

Language: English

Topic: Advanced MEMS and NEMS Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W2028585427

FWCI: 1.873

Cites: 2

Cited by: 6

Related to: 10