Work

Global model of Ar, O2, Cl2, and Ar/O2 high-density plasma discharges

Year: 1995

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/1.579366

Authors: C. Lee, M. A. Lieberman

Institution: University of California, Berkeley

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2028679502

FWCI: 12.97

Cites:

Cited by: 579

Related to: 9