Work

Study of thin film annealing by ellipsometry

Year: 1969

Type: article

Source: Surface Science

DOI: 10.1016/0039-6028(69)90033-8

Authors: J.R. Adams, K.K. Rao

Institution: University of Nebraska–Lincoln

Language: English

Topic: Optical Polarization and Ellipsometry

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2029633648

FWCI:

Cites: 12

Cited by: 2

Related to: 10