Hole–Mask Colloidal Lithography
Year: 2007
Type: article
Source: Advanced Materials
Authors: H. Fredriksson, Y. Alaverdyan, A. Dmitriev, C. Langhammer, D. S. Sutherland, M. Zäch, B. Kasemo
Institutions: Chalmers University of Technology, Aarhus University
Language: English
Subfield: Surfaces, Coatings and Films
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2030814280