Work

Electrically curable double-layer polymer resist for dynamic nanoscale lithography

Year: 2008

Type: article

Source: Soft Matter

DOI: 10.1039/b801101j

Authors: Haixiong Ge, Wenjiang Shen, Yong Chen

Institutions: California NanoSystems Institute, University of California, Los Angeles

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Science Foundation

OpenAlex ID: W2031079686

FWCI:

Cites: 23

Cited by: 3

Related to: 10