Work

Pulse and pulse reverse plating—Conceptual, advantages and applications

Year: 2007

Type: article

Source: Electrochimica Acta

DOI: 10.1016/j.electacta.2007.11.054

Authors: M.S. Chandrasekar, Malathy Pushpavanam

Institution: Central Electrochemical Research Institute

Language: English

Topic: Electrodeposition and Electroless Coatings

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2031332021

FWCI: 11.39

Cites: 130

Cited by: 893

Related to: 10