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OWL-Based Nanomasks for Preparing Graphene Ribbons with Sub-10 nm Gaps

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Year: 2012
Type: article
Source: Nano Letters
DOI: 10.1021/nl302171z
Authors: Xiaozhu Zhou, Chad M. Shade, Abrin L. Schmucker, Keith A. Brown, Shu He, Freddy Boey, Jan Ma, Hua Zhang, Chad A. Mirkin
Institutions: Nanyang Technological University, Northwestern University, International Institute for Nanotechnology
Language: English

Topic: Graphene research and applications
Subfield: Materials Chemistry
Field: Materials Science
Domain: Physical Sciences

Open Access status: closed

Funders: U.S. Department of Defense, U.S. Department of Energy, Northwestern University, Office of Science, International Institute for Nanotechnology, Northwestern University, Office of Naval Research, Basic Energy Sciences, Energy Frontier Research Centers
Award: TAS::89 0227::TAS RECOVERY; NEW: RECOVERY ACT - CENTER FOR INTEGRATED TRAINING IN FAR-FROM-EQUILIBRIUM AND ADAPTIVE MATERIALS (CITFAM) -- EFRC; PI -
OpenAlex ID: W2031652248
FWCI: 0.868
Cites: 34
Cited by: 14
Related to: 10
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