Work

Efficient extraction window for high-throughput x-ray lithography beamlines

Year: 1995

Type: article

Source: Review of Scientific Instruments

DOI: 10.1063/1.1145755

Authors: Kenichi Kuroda, Takashi Kaneko, Seiichi Itabashi

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2031775714

FWCI: 0.479

Cites: 6

Cited by: 6

Related to: 10