Work

Roadmap for 22nm and beyond (Invited Paper)

Year: 2009

Type: article

Source: Microelectronic Engineering

DOI: 10.1016/j.mee.2009.03.129

Author: H. Iwai

Institution: Tokyo Institute of Technology

Language: English

Topic: Advancements in Semiconductor Devices and Circuit Design

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W2031805653

FWCI: 14.15

Cites: 11

Cited by: 311

Related to: 10