Work

Oxidation of Polycrystalline Copper Thin Films at Ambient Conditions

Year: 2008

Type: article

Source: The Journal of Physical Chemistry C

DOI: 10.1021/jp076981k

Authors: Ilia Platzman, Reuven Brener, Hossam Haick, Rina Tannenbaum

Institutions: Georgia Institute of Technology, Technion – Israel Institute of Technology

Language: English

Topic: Copper-based nanomaterials and applications

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2032430168

FWCI: 3.276

Cites: 56

Cited by: 929

Related to: 10