Work

Integration of chemical-mechanical polishing into CMOS integrated circuit manufacturing

Year: 1992

Type: article

Source: Thin Solid Films

DOI: 10.1016/0040-6090(92)90539-n

Authors: Howard Landis, Peter Burke, William Cote, William Hill, Cheryl Hoffman, Carter Kaanta, Charles Koburger, Walter Lange, Micheal Leach, Stephen Luce

Institution: IBM (United States)

Language: English

Topic: Advanced Surface Polishing Techniques

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2032824931

FWCI: 3.337

Cites: 9

Cited by: 104

Related to: 10