Work

Comprehensive study of the resistivity of copper wires with lateral dimensions of 100 nm and smaller

Year: 2004

Type: article

Source: Journal of Applied Physics

DOI: 10.1063/1.1834982

Authors: W. Steinhögl, G. Schindler, G. Steinlesberger, M. Traving, M. Engelhardt

Institution: Infineon Technologies (Germany)

Language: English

Topic: Copper Interconnects and Reliability

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2034089924

FWCI: 9.974

Cites: 11

Cited by: 530

Related to: 10