Oxygen-Atom Defects In 6H Silicon Carbide Implanted Using 24- MeV O[sup 3+] Ions Measured Using Three-Dimensional Positron Annihilation Spectroscopy System (3DPASS)
Year: 2011
Type: conference-paper
Source: AIP conference proceedings
DOI: 10.1063/1.3586141
Language: English
Subfield: Mechanics of Materials
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2034118117
