Work

Surface roughness at the Si(100)- SiO2 interface

Year: 1985

Type: article

Source: Physical review. B, Condensed matter

DOI: 10.1103/physrevb.32.8171

Authors: S. M. Goodnick, D. K. Ferry, C. W. Wilmsen, Z. Liliental, D. Fathy, O. L. Krivanek

Institutions: Colorado State University, Arizona State University

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Science Foundation, Office of Naval Research, U.S. Naval Research Laboratory

OpenAlex ID: W2034427507

FWCI: 10.32

Cites: 30

Cited by: 595

Related to: 10