Work

Lithography simulation: modeling techniques and selected applications

Year: 2009

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.829409

Authors: Andreas Erdmann, Tim Fühner, Feng Shao, Peter Evanschitzky

Institution: Fraunhofer Institute for Integrated Systems and Device Technology

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2036929567

FWCI: 1.915

Cites:

Cited by: 20

Related to: 10