A Fast $I{-}V$ Screening Measurement for TDDB Assessment of Ultra-Thick Inter-Metal Dielectrics
Year: 2014
Type: article
Source: IEEE Electron Device Letters
Institutions: ON Semiconductor (United States), Arizona State University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2038081445