Work

High resolution fabrication of nanostructures using controlled proximity nanostencil lithography

Year: 2014

Type: article

Abstract: Nanostencil lithography has a number of distinct benefits that make it an attractive nanofabrication processes, but the inability to fabricate features with nanometer precision has significantly limited its utility. In this paper, we describe a nanostencil lithography process that provides sub-15 nm resolution even for 40-nm thick structures by using a sacrificial layer to control the proximity between the stencil and substrate, thereby enhancing the correspondence between nanostencil patterns and fabricated nanostructures. We anticipate that controlled proximity nanostencil lithography will provide an environmentally stable, clean, and positive-tone candidate for fabrication of nanostructures with high resolution.

Source: Applied Physics Letters

DOI: 10.1063/1.4867014

Authors: T. Jain, M. Aernecke, V. Liberman, R. Karnik

Institutions: Massachusetts Institute of Technology, MIT Lincoln Laboratory

Language: English

Topic: Nanofabrication and Lithography Techniques

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: green

Funder: National Science Foundation

Award: MIT Materials Research Science and Engineering Center (MRSEC)