Work

High-throughput and fully automated system for molecular-beam epitaxy

Year: 1988

Type: article

Source: Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena

DOI: 10.1116/1.584425

Authors: Junro Sakai, Shun-ichi Murakami, Kimiaki Hirama, Tetsuo Ishida, Zenjiro Oda

Institution: Anelva Corporation (Japan)

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2040738002

FWCI:

Cites:

Cited by: 9

Related to: 10