Work

Effect of Cl2- and HBr-based inductively coupled plasma etching on InP surface composition analyzed using in situ x-ray photoelectron spectroscopy

Year: 2012

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/1.3692751

Authors: S. Bouchoule, L. Vallier, G. Patriarche, T. Chevolleau, C. Cardinaud

Institutions: Centre National de la Recherche Scientifique, Commissariat à l'Énergie Atomique et aux Énergies Alternatives, CEA Grenoble, Laboratoire des Technologies de la Microélectronique, Laboratoire d'Électronique des Technologies de l'Information, Institut des Matériaux Jean Rouxel, Université de Nantes, Nantes Université

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Agence Nationale de la Recherche

Award: INductively Couped pLasmas for CMOS-compatible etchINg of high performance III-V integrated laser sourcEs

OpenAlex ID: W2041262082

FWCI: 1.801

Cites: 34

Cited by: 25

Related to: 10