Work

A step-and-repeat x-ray exposure system for 0.5 μm pattern replication

Year: 1985

Type: article

Source: Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena

DOI: 10.1116/1.582942

Authors: T. Hayasaka, S. Ishihara, H. Kinoshita, N. Takeuchi

Institution: NTT (Japan)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2043991015

FWCI: 1.086

Cites:

Cited by: 15

Related to: 10