Work

Synthesis of photoresists for 157-nm microlithography using CO 2

Year: 2004

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.535165

Authors: Mary Kate Boggiano, Joseph M. DeSimone

Institutions: University of North Carolina at Chapel Hill, North Carolina State University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Science Foundation

OpenAlex ID: W2044176736

FWCI:

Cites:

Cited by: 1

Related to: 10