Ion- and electron-assisted gas-surface chemistry—An important effect in plasma etching
Year: 1979
Type: article
Source: Journal of Applied Physics
DOI: 10.1063/1.326355
Authors: J. W. Coburn, Harold F. Winters
Institutions: IBM (United States), IBM Research - Almaden
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2044924796