Work

Schottky Barrier and Electronic States at Silicide-Silicon Interfaces

Year: 1985

Type: article

Source: MRS Proceedings

DOI: 10.1557/proc-54-469

Authors: P. E. Schmid, M. Liehr, F. K. Legoues, P. S. Ho

Institutions: École Polytechnique Fédérale de Lausanne, IBM Research - Thomas J. Watson Research Center

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2044934450

FWCI: 0.477

Cites: 12

Cited by: 6

Related to: 10