Work

Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Quantum Limit

Year: 1999

Type: article

Source: Physical Review Letters

Authors: J. P. Dowling, Agedi N. Boto, Daniel M. Abrams, C. P. Williams

Language: English

Topic: Quantum Information and Cryptography

Subfield: Artificial Intelligence

Field: Computer Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2045276691

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