Work

Evaluation results for the positive deep-UV resist AZ DX 46

Year: 1994

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.175402

Authors: Walter Spiess, Thomas J. Lynch, Charles Le Cornec, Gary C. Escher, Yoshiaki Kinoshita, John Kochan, Takanori Kudo, Seiya Masuda, Thierry Mourier, Yuko Nozaki, Setha G. Olson, Hiroshi Okazaki, Munirathna Padmanaban, Georg Pawlowski, Klaus J. Przybilla, Horst Roeschert, Natusmi Suehiro, Francoise Vinet, Horst Wengenroth

Institutions: Celanese (United States), Laboratoire d'Électronique des Technologies de l'Information

Language: Hungarian

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2045596047

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