Work

Alteration of Cu conductivity in the size effect regime

Year: 2004

Type: article

Source: Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

DOI: 10.1116/1.1642639

Authors: S. M. Rossnagel, T. S. Kuan

Institutions: IBM (United States), State University of New York, University at Albany, State University of New York

Language: English

Topic: Copper Interconnects and Reliability

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2046530548

FWCI: 12.57

Cites: 20

Cited by: 461

Related to: 10