Work

Boron carbon nitride film with low dielectric constant as passivation film for high speed electronic devices

Year: 2004

Type: article

Source: Diamond and Related Materials

DOI: 10.1016/j.diamond.2003.12.013

Authors: Shuichi Umeda, Tadao Yuki, Tomohiko Sugiyama, Takashi Sugino

Institution: The University of Osaka

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2047804583

FWCI: 2.276

Cites: 13

Cited by: 48

Related to: 10