Reactive Ion Etching of BiSrCaCuO Superconducting Thin Films using Ethane and Oxygen
Year: 1994
Type: article
DOI: 10.1143/jjap.33.l315
Authors: Toshiyuki Oishi, Tetsuya Takami, Ken'ichi Kuroda, Kazuyoshi Kojima, Osamu Wada, Masahiro Nunoshita Masahiro Nunoshita
Institution: Mitsubishi Electric (Japan)
Language: English
Subfield: Condensed Matter Physics
Field: Physics and Astronomy
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W2048017995