Work

On the Displacement of Adsorbed Polyethylene Glycol by 3-Mercapto-1-Propanesulfonate during Copper Electrodeposition

Year: 2014

Type: article

Abstract: Displacement of the suppressor polyethylene glycol (PEG) by the accelerant 3-mercapto-1-propanesulfonate (MPS) during copper electrodeposition was studied by a chronoamperometric addition technique. Displacement of PEG occurs through a process of MPS domain nucleation, mass-transfer limited domain expansion and an asymptotic approach to equilibrium between MPS in solution and that on the surface. An isotherm is proposed to account for the equilibrium coverage over a wide range of MPS concentrations, and the nearest neighbor separation between adsorbed MPS molecules during deposition is estimated.

Source: Journal of The Electrochemical Society

DOI: 10.1149/2.0371412jes

Authors: Ashleigh Kreider, Dale P. Barkey, Edward H. Wong

Institution: University of New Hampshire

Language: English

Topic: Electrodeposition and Electroless Coatings

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: hybrid

Estimated APC paid: $1,950

OpenAlex ID: W2049859099

FWCI: 1.24

Cites: 16

Cited by: 17

Related to: 10