Work

Nanoscale patterning using self-assembled polymers for semiconductor applications

Year: 2001

Type: article

Source: Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

DOI: 10.1116/1.1421551

Authors: K. W. Guarini, C. T. Black, K. R. Milkove, R. L. Sandstrom

Institution: IBM Research - Thomas J. Watson Research Center

Language: English

Topic: Block Copolymer Self-Assembly

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2052638041

FWCI: 5.553

Cites: 16

Cited by: 177

Related to: 10