Work

Understanding illumination effects for control of optical proximity effects (OPE)

Year: 2008

Type: conference-paper

Source: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

DOI: 10.1117/12.773632

Authors: Donis G. Flagello, Bernd Geh, Robert Socha, Peng Liu, Yu Cao, Roland Stas, Oliver Natt, Jörg Zimmermann

Institutions: ASML (United States), ASML (Netherlands), Carl Zeiss (Germany)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W2053221764

FWCI: 0.948

Cites:

Cited by: 11

Related to: 10